Growth of silicon oxynitride films by atmospheric pressure plasma jet
journal contribution
posted on 2024-11-07, 20:06 authored by X. Zhang, S. PtasinskaNone Given
History
Temporal Coverage
2014Extent
Page 145202Publisher
J. Phys. DSource
Volume 14Usage metrics
Categories
No categories selectedKeywords
Exports
RefWorks
BibTeX
Ref. manager
Endnote
DataCite
NLM
DC