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Growth of Alumina from Aluminum Films Using Oxygen Plasma

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thesis
posted on 2004-08-11, 00:00 authored by Nicholas Anderson
In this thesis the growth of aluminum oxides, specifically alumina, is described. The research will be applied to single electron memories. The aluminum oxides are grown using a variety of oxygen plasmas. A variety of experimental techniques and setups are described and explained. Preliminary results will be discussed as these guided the changes in the experiments. The changes in setups will then be discussed in order to explain the reasoning behind these changes, and troubleshooting of the techniques is described, and annotated. Final setups and techniques are shown to allow for reproduction. Finally, the results of the experiments are shown and commented on. Lastly, the implications for single electron memories and future work are discussed.

History

Date Created

2004-08-11

Date Modified

2018-10-30

Research Director(s)

Greg Snider

Committee Members

Debdeep Jena Gary Bernstein

Degree

  • Master of Science in Electrical Engineering

Degree Level

  • Master's Thesis

Language

  • English

Alternate Identifier

etd-08112004-081951

Publisher

University of Notre Dame

Program Name

  • Electrical Engineering

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