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  • Inventor(s):
    Michael M. Crouse, Albert E. Miller, Juan Jiang, David T. Crouse, Subash C. Basu
    Patent Number:
    US 6869671 B2

    A thin film based nanoporous alumina template has been developed which allows the in situ removal of an electrically insulating alumina barrier layer at the pore bases. This barrier free nanoporous system has great utility for electrodeposition of a wide variety of nanowire materials. An exemplary multilayer thin film precursor is provided comprising Al (anodization layer), Ti (diffusion barrier) and Pt (active electrode) on a Si substrate. Aluminum anodization in sulfuric acid with a subsequ…

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