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  • Author(s):
    Ibrahem Jasim, Jiayu Liu, Yuyao Yang, Chuang Zu, Chen Zhu, Muhammad Roman, Jie Huang, Edward Kinzel, Mahmoud Almasri

    This paper studies the use of Microsphere Photolithography (MPL) as an alternative to Focused Ion Beam milling or e-beam lithography to pattern plasmonic fiber-optic based sensors. In the MPL approach, silica microspheres are self- assembled to form a Hexagonal Close-Packed (HCP) array on top of a layer of photoresist. The microspheres serve as an optical element and focus collimated UV radiation to an array of photonic jets inside the photoresist layer. The exposed region is dependent on the…

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