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  • Author(s):
    Jin Qin, Edward Kinzel, Liang Wang
    Abstract:

    In this article, we demonstrate a specially designed resonant metamaterial with epsilon-near-zero (ENZ) and nanoantenna to enhance the exposure depth in plasmonic direct writing lithography more than 10 times. The ENZ metamaterial composed of a Ag/Si3N4 multilayer thin film, converts the evanescent field generated by the bowtie aperture nanoantenna to propagating waves with low divergence and high collimation. Deep sub-diffraction limited resolution of less than 65 nm (λ/7) with exposure dept…

    Date Published:
    2019-08
  • Author(s):
    Nicholas Capps, Chen Zhu, Jen Hsien Hsu, Johnathan Goldstein, Richard Brow, Jie Huang, Doulgas Bristow, Robert Landers, Edward Kinzel
    Abstract:

    Additive Manufacturing (AM) of low-profile 2.5D glass structures is demonstrated using a fiber-fed laser-heated process. In this process, glass single mode optical fibers with diameters 90-125 μm are fed into the intersection of a workpiece and CO2 laser beam. The workpiece is positioned by a four-axis CNC stage. Issues unique to the process are discussed, including the thermal breakdown of the glass and index inhomogeneity. Scanning electron microscopy reveals that the core/cladding structur…

    Date Published:
    2019-03
  • Author(s):
    Ibrahem Jasim, Jiayu Liu, Yuyao Yang, Chuang Zu, Chen Zhu, Muhammad Roman, Jie Huang, Edward Kinzel, Mahmoud Almasri
    Abstract:

    This paper studies the use of Microsphere Photolithography (MPL) as an alternative to Focused Ion Beam milling or e-beam lithography to pattern plasmonic fiber-optic based sensors. In the MPL approach, silica microspheres are self- assembled to form a Hexagonal Close-Packed (HCP) array on top of a layer of photoresist. The microspheres serve as an optical element and focus collimated UV radiation to an array of photonic jets inside the photoresist layer. The exposed region is dependent on the…

    Date Published:
    2019-06