Enabling nanostructured materials via multilayer thin film precursor and applications to biosensors

Patent

Description

A thin film based nanoporous alumina template has been developed which allows the in situ removal of an electrically insulating alumina barrier layer at the pore bases. This barrier free nanoporous system has great utility for electrodeposition of a wide variety of nanowire materials. An exemplary multilayer thin film precursor is provided comprising Al (anodization layer), Ti (diffusion barrier) and Pt (active electrode) on a Si substrate. Aluminum anodization in sulfuric acid with a subsequent applied voltage ramping program produces a Pt electrode at the base of the nanopores without the additional steps of alumina removal, barrier layer dissolution, and metal deposition onto the pore bottoms.

Attributes

Attribute NameValues
Title
  • Enabling nanostructured materials via multilayer thin film precursor and applications to biosensors

Patent Number
  • US 6869671 B2

USPTO Link
Inventor
  • Michael M. Crouse

  • Albert E. Miller

  • Juan Jiang

  • David T. Crouse

  • Subash C. Basu

Inventor From Local Institution
  • Albert E. Miller

  • Subhash C. Basu

Other Application
  • 10/449,618

Claims
  • 53

Classification (US Patent)
  • 428/304.4; 428/209; 428/307.3; 428/312.2; 428/312.8; 428/314.8; 428/315.5; 428/315.7; 428/315.9; 428/317.1; 428/317.7; 428/318.4; 428/319.1; 428/432; 428/446; 428/457; 428/469; 428/472; 428/472.2; 428/620; 428/632; 428/639; 428/640; 428/641; 428/650; 428/651; 428/652; 428/654; 428/660; 428/668; 428/670; 428/672; 428/689; 428/699; 428/701; 428/702; 977/856; 977/888;

Cooperative Patent Classification codes
  • G01N 27/30 (20130101); Y10S 977/856 (20130101); Y10S 977/888 (20130101)

International Patent Classification codes
  • B32B 3/00 (20060101); B32B 003/00 ()

Language
  • eng

Date Issued
  • 2005-03-22

Publisher
  • United States Patent and Trademark Office

Assignee
  • University of Notre Dame Du Lac

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