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Deep plasmonic direct writing lithography with ENZ metamaterials and nanoantenna
journal contribution
posted on 2019-10-11, 00:00 authored by Edward Kinzel, Jin Qin, Liang WangIn this article, we demonstrate a specially designed resonant metamaterial with epsilon-near-zero (ENZ) and nanoantenna to enhance the exposure depth in plasmonic direct writing lithography more than 10 times. The ENZ metamaterial composed of a Ag/Si3N4 multilayer thin film, converts the evanescent field generated by the bowtie aperture nanoantenna to propagating waves with low divergence and high collimation. Deep sub-diffraction limited resolution of less than 65 nm (λ/7) with exposure depth greater than 100 nm is achieved. This work brings plasmonic direct writing lithography one step closer to practical applicaitons.
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2019-10-11Language
- English
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0957-4484Publisher
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