In this article, we demonstrate a specially designed resonant metamaterial with epsilon-near-zero (ENZ) and nanoantenna to enhance the exposure depth in plasmonic direct writing lithography more than 10 times. The ENZ metamaterial composed of a Ag/Si3N4 multilayer thin film, converts the evanescent field generated by the bowtie aperture nanoantenna to propagating waves with low divergence and high collimation. Deep sub-diffraction limited resolution of less than 65 nm (λ/7) with exposure depth greater than 100 nm is achieved. This work brings plasmonic direct writing lithography one step closer to practical applicaitons.
Deep plasmonic direct writing lithography with ENZ metamaterials and nanoantennaArticle
|Journal or Work Title|
|Departments and Units|
Digital Object Identifier
This DOI is the best way to cite this article.