Deep plasmonic direct writing lithography with ENZ metamaterials and nanoantenna

Article

Abstract

In this article, we demonstrate a specially designed resonant metamaterial with epsilon-near-zero (ENZ) and nanoantenna to enhance the exposure depth in plasmonic direct writing lithography more than 10 times. The ENZ metamaterial composed of a Ag/Si3N4 multilayer thin film, converts the evanescent field generated by the bowtie aperture nanoantenna to propagating waves with low divergence and high collimation. Deep sub-diffraction limited resolution of less than 65 nm (λ/7) with exposure depth greater than 100 nm is achieved. This work brings plasmonic direct writing lithography one step closer to practical applicaitons.

Attributes

Attribute NameValues
Creator
  • Jin Qin

  • Edward Kinzel

  • Liang Wang

Journal or Work Title
  • Nanotechnology

Volume
  • 30

Issue
  • 42

First Page
  • 425303

Last Page
  • 425309

ISSN
  • 0957-4484

Publication Date
  • 2019-08

Publisher
  • IOP Publishing

Date Created
  • 2019-10-11

Language
  • English

Departments and Units
Record Visibility and Access Public
Content License
  • All rights reserved

Digital Object Identifier

doi:10.1088/1361-6528/ab33f7

This DOI is the best way to cite this article.